China has secretly built a prototype extreme ultraviolet (EUV) lithography machine—the most advanced tool needed to make cutting-edge AI chips—marking a major step toward semiconductor self-sufficiency.

Developed in a high-security lab in Shenzhen and completed in early 2025, the machine was reverse-engineered by former ASML engineers and now fills nearly an entire factory floor. It can generate EUV light but has not yet produced working chips. China aims for success by 2028, though insiders say 2030 is more realistic.

The project, described by Reuters sources as a Chinese “Manhattan Project,” is backed by the government, coordinated in part by Huawei, and involves thousands of engineers operating under strict secrecy. Recruitment of retired and overseas Chinese experts, aggressive incentives, and the reuse of parts from older Western machines have accelerated progress.

Despite the breakthrough, China still lags behind ASML in precision optics and reliability. Even so, the existence of a working EUV prototype suggests China is far closer to rivaling Western chipmaking capabilities than previously believed, despite years of U.S. and allied export controls.

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One resolution, led by Rep. Gregory Meeks (D-N.Y.), sought to halt U.S. strikes on drug boats unless Congress authorized them. The administration has justified at least 25 strikes—killing a reported 95 people—by labeling several Latin American cartels as terrorist groups. The measure failed 210–216.

A second resolution, introduced by Rep. Jim McGovern (D-Mass.), would have required congressional approval for any U.S. military action in or against Venezuela, following Trump’s order to blockade sanctioned oil tankers. That resolution failed 211–213.

Source: The Hill

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